Tìm kiếm

Tiêu chí lọc:

Tiêu chí lọc:

Tác giả

Năm xuất bản

Toàn văn

Kết quả tìm kiếm

Hiện thị kết quả từ 1 đến 2 của 2
  • <<
  • 1
  • >>
    • Nanoscale Film Thickness Gradients Printed in Open Air by Spatially Varying Chemical Vapor Deposition
    Tác giả : Abdullah H. Alshehri; Jhi Yong Loke; Viet Huong Nguyen; Alexander Jones; Hatameh Asgarimoghaddam; Louis-Vincent Delumeau; Ahmed Shahin; Khaled H. Ibrahim; Kissan Mistry; Mustafa Yavuz; David Muñoz-Rojas; Kevin P. Musselman;  Người hướng dẫn: -;  Đồng tác giả: - (2021)

    Nanoscale films are integral to all modern electronics. To optimize device performance, researchers vary the film thickness by making batches of devices, which is time-consuming and produces experimental artifacts. Thin films with nanoscale thickness gradients that are rapidly deposited in open air for combinatorial and high-throughput (CHT) studies are presented. Atmospheric pressure spatial atomic layer deposition reactor heads are used to produce spatially varying chemical vapor deposition rates on the order of angstroms per second. ZnO and Al2O3 films are printed with nm-scale thickness gradients in as little as 45 s and CHT analysis of a metal-insulator-metal diode and perovskite solar cell is performed. By testing 360 Pt/Al2O3/Al diodes with 18 different Al2O3 thicknesses on o...
    • Nanoscale Film Thickness Gradients Printed in Open Air by Spatially Varying Chemical Vapor Deposition
    Tác giả : Abdullah H. Alshehr; Jhi Yong Loke; Viet Huong Nguyen; Alexander Jones; Hatameh Asgarimoghaddam; Louis-Vincent Delumeau; Ahmed Shahin; Khaled H. Ibrahim; Kissan Mistry; Mustafa Yavuz; David Mu�oz-Rojas; Kevin P. Musselman;  Người hướng dẫn: -;  Đồng tác giả: - (2021)

    Nanoscale films are integral to all modern electronics. To optimize device performance, researchers vary the film thickness by making batches of devices, which is time-consuming and produces experimental artifacts. Thin films with nanoscale thickness gradients that are rapidly deposited in open air for combinatorial and high-throughput (CHT) studies are presented. Atmospheric pressure spatial atomic layer deposition reactor heads are used to produce spatially varying chemical vapor deposition rates on the order of angstroms per second. ZnO and Al2O3 films are printed with nm-scale thickness gradients in as little as 45 s and CHT analysis of a metal-insulator-metal diode and perovskite solar cell is performed. By testing 360 Pt/Al2O3/Al diodes with 18 different Al2O3 thicknesses on o...