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Nhan đề : 
Regulating the Electrical and Mechanical Properties of TaS2 Films via van der Waals and Electrostatic Interaction for High Performance Electromagnetic Interference Shielding
Tác giả : 
Fukang, Deng
Jianhong, Wei
Yadong, Xu
Năm xuất bản : 
2023
Nhà xuất bản : 
Springer
Tóm tắt : 
Low-dimensional transition metal dichalcogenides (TMDs) have unique electronic structure, vibration modes, and physicochemical properties, making them suitable for fundamental studies and cutting-edge applications such as silicon electronics, optoelectronics, and bioelectronics. However, the brittleness, low toughness, and poor mechanical and electrical stabilities of TMD-based films limit their application. Herein, a TaS2 freestanding film with ultralow void ratio of 6.01% is restacked under the effect of bond-free van der Waals (vdW) interactions within the staggered 2H-TaS2 nanosheets. The restacked films demonstrated an exceptionally high electrical conductivity of 2,666 S cm−1, electromagnetic interference shielding effectiveness (EMI SE) of 41.8 dB, and absolute EMI SE (SSE/t) of 27,859 dB cm2 g−1, which is the highest value reported for TMD-based materials.
Mô tả: 
CC BY
URI: 
https://link.springer.com/article/10.1007/s40820-023-01061-1
https://dlib.phenikaa-uni.edu.vn/handle/PNK/8057
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